Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

François Neuilly; Jean Paul Booth; Laurent Vallier

doi:10.1116/1.1430247

Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

François Neuilly
, Jean Paul Booth
, Laurent Vallier

Philips Research
Lab. Technol. de la Microlectron.

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

Résumé

Inductively coupled chlorine plasmas were studied by ultraviolet absorption spectroscopy. The absolute dissociation degree of Cl₂ was measured over a wide range of pressures and source powers. The Cl₂ dissociation rate increased with the injected source power. At higher pressure, the electron temperature was lower. A simple global model showed good agreement with the measurements.

langue originale	Anglais
Pages (de - à)	225-229
Nombre de pages	5
journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	20
Numéro de publication	1
Les DOIs	https://doi.org/10.1116/1.1430247
état	Publié - 1 janv. 2002

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10.1116/1.1430247

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title = "Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy",

abstract = "Inductively coupled chlorine plasmas were studied by ultraviolet absorption spectroscopy. The absolute dissociation degree of Cl2 was measured over a wide range of pressures and source powers. The Cl2 dissociation rate increased with the injected source power. At higher pressure, the electron temperature was lower. A simple global model showed good agreement with the measurements.",

author = "Fran{\c c}ois Neuilly and Booth, \{Jean Paul\} and Laurent Vallier",

year = "2002",

month = jan,

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doi = "10.1116/1.1430247",

language = "English",

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journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

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Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy. / Neuilly, François; Booth, Jean Paul; Vallier, Laurent.
Dans: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol 20, Numéro 1, 01.01.2002, p. 225-229.

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

TY - JOUR

T1 - Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

AU - Neuilly, François

AU - Booth, Jean Paul

AU - Vallier, Laurent

PY - 2002/1/1

Y1 - 2002/1/1

N2 - Inductively coupled chlorine plasmas were studied by ultraviolet absorption spectroscopy. The absolute dissociation degree of Cl2 was measured over a wide range of pressures and source powers. The Cl2 dissociation rate increased with the injected source power. At higher pressure, the electron temperature was lower. A simple global model showed good agreement with the measurements.

AB - Inductively coupled chlorine plasmas were studied by ultraviolet absorption spectroscopy. The absolute dissociation degree of Cl2 was measured over a wide range of pressures and source powers. The Cl2 dissociation rate increased with the injected source power. At higher pressure, the electron temperature was lower. A simple global model showed good agreement with the measurements.

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U2 - 10.1116/1.1430247

DO - 10.1116/1.1430247

M3 - Article

AN - SCOPUS:0036166062

SN - 0734-2101

VL - 20

SP - 225

EP - 229

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 1

ER -

Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy

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