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Conductive-probe atomic force microscopy characterization of silicon nanowire

  • José Alvarez
  • , Irène Ngo
  • , Marie Estelle Gueunier-Farret
  • , Jean Paul Kleider
  • , Linwei Yu
  • , Pere Rocai Cabarrocas
  • , Simon Perraud
  • , Emmanuelle Rouvière
  • , Caroline Celle
  • , Céline Mouchet
  • , Jean Pierre Simonato
  • Université Paris-Sud 11
  • Institut polytechnique de Paris
  • Univ. Joseph Fourier-Grenoble 1

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

39 Citations (Scopus)

Résumé

The electrical conduction properties of lateral and vertical silicon nanowires (SiNWs) were investigated using a conductive-probe atomic force microscopy (AFM). Horizontal SiNWs, which were synthesized by the in-plane solidliquid-solid technique, are randomly deployed into an undoped hydrogenated amorphous silicon layer. Local current mapping shows that the wires have internal microstructures. The local current-voltage measurements on these horizontal wires reveal a power law behavior indicating several transport regimes based on space-charge limited conduction which can be assisted by traps in the high-bias regime (> 1 V). Vertical phosphorus-doped SiNWs were grown by chemical vapor deposition using a gold catalyst-driving vapor-liquid-solid process on higly n-type silicon substrates. The effect of phosphorus doping on the local contact resistance between the AFM tip and the SiNW was put in evidence, and the SiNWs resistivity was estimated.

langue originaleAnglais
Numéro d'article110
journalNanoscale Research Letters
Volume6
Numéro de publication1
Les DOIs
étatPublié - 1 janv. 2011

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