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Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms

  • Institut polytechnique de Paris

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

26 Citations (Scopus)

Résumé

In this paper, we investigate the excitation of a capacitively coupled plasma using a non-sinusoidal voltage waveform whose amplitude- and slope-asymmetry varies continuously with a period which is a multiple of the fundamental RF period. We call this period the 'beating' period. Through particle-in-cell (PIC) simulations, we show that such waveforms cause oscillation of the self-bias at this beating frequency, corresponding to the charging and discharging of the external capacitor. The amplitude of this self-bias oscillation depends on the beating period, the value of the external capacitor, and the ion flux to the electrodes. This self-bias oscillation causes temporal modulation of the ion flux distribution function (IFDF), albeit at a constant ion flux and constant mean ion energy, and allows the energy width of the IFDF (averaged over the beating period) to be varied in a controlled fashion.

langue originaleAnglais
Numéro d'article025006
journalPlasma Sources Science and Technology
Volume25
Numéro de publication2
Les DOIs
étatPublié - 8 févr. 2016

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