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Dependence of the saturated light-induced defect density on macroscopic properties of hydrogenated amorphous silicon

  • H. R. Park
  • , J. Z. Liu
  • , P. Roca I Cabarrocas
  • , A. Maruyama
  • , M. Isomura
  • , S. Wagner
  • , J. R. Abelson
  • , F. Finger
  • Princeton University
  • University of Illinois
  • University of Neuchâtel

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

34 Citations (Scopus)

Résumé

We report a study of the saturated light-induced defect density N s,sat in 37 hydrogenated (and in part fluorinated) amorphous silicon [a-Si:H(F)] films grown in six different reactors under widely different conditions. Ns,sat was attained by exposing the films to light from a krypton ion laser (λ=647.1 nm). Ns,sat is determined by the constant photocurrent method and lies between 5×1016 and 2×1017 cm-3. Ns,sat drops with decreasing optical gap Eopt and hydrogen content cH, but is not correlated with the initial defect density Ns,ann or with the Urbach tail energy Eu. We discuss our results within the framework of existing models for light-induced defects.

langue originaleAnglais
Pages (de - à)1440-1442
Nombre de pages3
journalApplied Physics Letters
Volume57
Numéro de publication14
Les DOIs
étatPublié - 1 déc. 1990
Modification externeOui

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