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Electron beam irradiation of n-type porous silicon obtained by photoelectrochemical etching

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Résumé

The effects of electron beam irradiation on luminescence and microstructure of n-type porous silicon (PS) have been investigated, using cathodoluminescence (CL) in the scanning electron microscope (SEM), and electron energy loss spectroscopy in the transmission electron microscope (TEM). In the SEM, the CL rapidly decreased with irradiation. It could be fully restored by boiling the samples in de-ionized water. In the TEM, freshly restored PS emerged as Si nano-crystallites embedded in an unstable silicon oxide. The effect of irradiation was to suppress the oxide, and also, in the case of proximity of carbon from the foil holding the sample, to change the crystallite composition to β-SiC.

langue originaleAnglais
Pages (de - à)1665
Nombre de pages1
journalApplied Physics Letters
Volume66
Numéro de publication13
Les DOIs
étatPublié - 1 janv. 1995

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