Résumé
Photodetachment microscopy of the negative ions Si- and F- has made it possible to measure the electron affinities of silicon and fluorine with improved accuracy. The new recommended electron affinities of 28Si and 19F are 11207.252(18) and 27432.446(19) cm-1, i.e. 1.389 5220(24) and 3.401 1895(25) eV, respectively.
| langue originale | Anglais |
|---|---|
| Pages (de - à) | L281-L288 |
| journal | Journal of Physics B: Atomic, Molecular and Optical Physics |
| Volume | 34 |
| Numéro de publication | 9 |
| Les DOIs | |
| état | Publié - 14 mai 2001 |
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