Erratum: Multi frequency matching for voltage waveform tailoring (Plasma Sources Science and Technology (2018) 27 (095012) DOI: 10.1088/1361-6595/aad2cd)

Frederik Schmidt; Julian Schulze; Erik Johnson; Jean Paul Booth; Douglas Keil; David M. French; Jan Trieschmann; Thomas Mussenbrock

doi:10.1088/1361-6595/aaeb4b

Erratum: Multi frequency matching for voltage waveform tailoring (Plasma Sources Science and Technology (2018) 27 (095012) DOI: 10.1088/1361-6595/aad2cd)

Frederik Schmidt
, Julian Schulze
, Erik Johnson
, Jean Paul Booth
, Douglas Keil
, David M. French
, Jan Trieschmann
, Thomas Mussenbrock

Ruhr-University Bochum
West Virginia University
LPP
Lam Research Corporation
Joint Faculty of the Brandenburg University of Technology Cottbus Senftenberg

Résultats de recherche: Contribution à un journal › Commentaire/débat

Résumé

Due to an error in the production process, the equation on should read: page (Formula Presented) is incorrect. The correct equation (Formula Presented).

langue originale	Anglais
Numéro d'article	019601
journal	Plasma Sources Science and Technology
Volume	28
Numéro de publication	1
Les DOIs	https://doi.org/10.1088/1361-6595/aaeb4b
état	Publié - 1 janv. 2019

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10.1088/1361-6595/aaeb4b

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Schmidt, F., Schulze, J., Johnson, E., Booth, J. P., Keil, D., French, D. M., Trieschmann, J., & Mussenbrock, T. (2019). Erratum: Multi frequency matching for voltage waveform tailoring (Plasma Sources Science and Technology (2018) 27 (095012) DOI: 10.1088/1361-6595/aad2cd). Plasma Sources Science and Technology, 28(1), Article 019601. https://doi.org/10.1088/1361-6595/aaeb4b

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title = "Erratum: Multi frequency matching for voltage waveform tailoring (Plasma Sources Science and Technology (2018) 27 (095012) DOI: 10.1088/1361-6595/aad2cd)",

abstract = "Due to an error in the production process, the equation on should read: page (Formula Presented) is incorrect. The correct equation (Formula Presented).",

author = "Frederik Schmidt and Julian Schulze and Erik Johnson and Booth, \{Jean Paul\} and Douglas Keil and French, \{David M.\} and Jan Trieschmann and Thomas Mussenbrock",

note = "Publisher Copyright: {\textcopyright} 2019 IOP Publishing Ltd.",

year = "2019",

month = jan,

day = "1",

doi = "10.1088/1361-6595/aaeb4b",

language = "English",

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journal = "Plasma Sources Science and Technology",

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Schmidt, F, Schulze, J, Johnson, E , Booth, JP, Keil, D, French, DM, Trieschmann, J & Mussenbrock, T 2019, 'Erratum: Multi frequency matching for voltage waveform tailoring (Plasma Sources Science and Technology (2018) 27 (095012) DOI: 10.1088/1361-6595/aad2cd)', Plasma Sources Science and Technology, VOL. 28, Numéro 1, 019601. https://doi.org/10.1088/1361-6595/aaeb4b

Erratum: Multi frequency matching for voltage waveform tailoring (Plasma Sources Science and Technology (2018) 27 (095012) DOI: 10.1088/1361-6595/aad2cd). / Schmidt, Frederik; Schulze, Julian; Johnson, Erik et al.
Dans: Plasma Sources Science and Technology, Vol 28, Numéro 1, 019601, 01.01.2019.

Résultats de recherche: Contribution à un journal › Commentaire/débat

TY - JOUR

T1 - Erratum

T2 - Multi frequency matching for voltage waveform tailoring (Plasma Sources Science and Technology (2018) 27 (095012) DOI: 10.1088/1361-6595/aad2cd)

AU - Schmidt, Frederik

AU - Schulze, Julian

AU - Johnson, Erik

AU - Booth, Jean Paul

AU - Keil, Douglas

AU - French, David M.

AU - Trieschmann, Jan

AU - Mussenbrock, Thomas

PY - 2019/1/1

Y1 - 2019/1/1

N2 - Due to an error in the production process, the equation on should read: page (Formula Presented) is incorrect. The correct equation (Formula Presented).

AB - Due to an error in the production process, the equation on should read: page (Formula Presented) is incorrect. The correct equation (Formula Presented).

UR - https://www.scopus.com/pages/publications/85062985071

U2 - 10.1088/1361-6595/aaeb4b

DO - 10.1088/1361-6595/aaeb4b

M3 - Comment/debate

AN - SCOPUS:85062985071

SN - 0963-0252

VL - 28

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

IS - 1

M1 - 019601

ER -

Erratum: Multi frequency matching for voltage waveform tailoring (Plasma Sources Science and Technology (2018) 27 (095012) DOI: 10.1088/1361-6595/aad2cd)

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