Exploration of the ultimate patterning potential achievable with focused ion beams

Jacques Gierak; Eric Bourhis; Dominique Mailly; Gilles Patriarche; Ali Madouri; Ralf Jede; Sven Bauerdick; Lars Bruchhaus; Peter Hawkes; Anne Laure Biance; Birgitta Schiedt; Loïc Auvray; Laurent Bardotti; Brigitte Prevel; Pascal Mélinon; Alain Perez; Jacques Ferré; Jean Pierre Jamet; Alexandra Mougin; Claude Chappert; Veronique Mathet; Lionel Aigouy; Isabelle Robert-Philip; Isabelle Sagnes; Rémy Braive; Alexios Beveratos; Izo Abram

doi:10.1557/proc-1089-y03-01

Exploration of the ultimate patterning potential achievable with focused ion beams

Jacques Gierak
, Eric Bourhis
, Dominique Mailly
, Gilles Patriarche
, Ali Madouri
, Ralf Jede
, Sven Bauerdick
, Lars Bruchhaus
, Peter Hawkes
, Anne Laure Biance
, Birgitta Schiedt
, Loïc Auvray
, Laurent Bardotti
, Brigitte Prevel
, Pascal Mélinon
, Alain Perez
, Jacques Ferré
, Jean Pierre Jamet
, Alexandra Mougin
, Claude Chappert

Veronique Mathet, Lionel Aigouy, Isabelle Robert-Philip, Isabelle Sagnes, Rémy Braive, Alexios Beveratos, Izo Abram

CNRS
Raith GmbH
CEMES-CNRS
Université d'Evry Val d'Essonne
IGFL, Université de Lyon, Université Lyon 1
Laboratoire de Physique des Solides
Université Paris-Saclay

Résultats de recherche: Le chapitre dans un livre, un rapport, une anthologie ou une collection › Contribution à une conférence › Revue par des pairs

Résumé

In this work we aim at evaluating the nano-structuring potential of a highly Focused Ion Beam. We will first detail a very high resolution FIB instrument we have developed. Then we will introduce and illustrate some advanced FIB processing schemes explored with this instrument. These patterning schemes are (i) Artificial nanopores direct engraving. (ii) Local defect injection for magnetic thin film direct patterning. (iii) Functionalization of atomically clean graphite surfaces. (iv) Engineering of the optical properties of microcavities.

langue originale	Anglais
titre	Materials Research Society Symposium Proceedings - Focused Ion Beams for Materials Characterization and Micromachining
Editeur	Materials Research Society
Pages	7-16
Nombre de pages	10
ISBN (imprimé)	9781605608761
Les DOIs	https://doi.org/10.1557/proc-1089-y03-01
état	Publié - 1 janv. 2008
Modification externe	Oui
Evénement	Focused Ion Beams for Materials Characterization and Micromachining - San Francisco, CA, États-Unis Durée: 24 mars 2008 → 28 mars 2008

Série de publications

Nom	Materials Research Society Symposium Proceedings
Volume	1089
ISSN (imprimé)	0272-9172

Une conférence

Une conférence	Focused Ion Beams for Materials Characterization and Micromachining
Pays/Territoire	États-Unis
La ville	San Francisco, CA
période	24/03/08 → 28/03/08

Accès au document

10.1557/proc-1089-y03-01

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Gierak, J., Bourhis, E., Mailly, D., Patriarche, G., Madouri, A., Jede, R., Bauerdick, S., Bruchhaus, L., Hawkes, P., Biance, A. L., Schiedt, B., Auvray, L., Bardotti, L., Prevel, B., Mélinon, P., Perez, A., Ferré, J., Jamet, J. P., Mougin, A., ... Abram, I. (2008). Exploration of the ultimate patterning potential achievable with focused ion beams. Dans Materials Research Society Symposium Proceedings - Focused Ion Beams for Materials Characterization and Micromachining (p. 7-16). (Materials Research Society Symposium Proceedings; Vol 1089). Materials Research Society. https://doi.org/10.1557/proc-1089-y03-01

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title = "Exploration of the ultimate patterning potential achievable with focused ion beams",

abstract = "In this work we aim at evaluating the nano-structuring potential of a highly Focused Ion Beam. We will first detail a very high resolution FIB instrument we have developed. Then we will introduce and illustrate some advanced FIB processing schemes explored with this instrument. These patterning schemes are (i) Artificial nanopores direct engraving. (ii) Local defect injection for magnetic thin film direct patterning. (iii) Functionalization of atomically clean graphite surfaces. (iv) Engineering of the optical properties of microcavities.",

author = "Jacques Gierak and Eric Bourhis and Dominique Mailly and Gilles Patriarche and Ali Madouri and Ralf Jede and Sven Bauerdick and Lars Bruchhaus and Peter Hawkes and Biance, \{Anne Laure\} and Birgitta Schiedt and Lo{\"i}c Auvray and Laurent Bardotti and Brigitte Prevel and Pascal M{\'e}linon and Alain Perez and Jacques Ferr{\'e} and Jamet, \{Jean Pierre\} and Alexandra Mougin and Claude Chappert and Veronique Mathet and Lionel Aigouy and Isabelle Robert-Philip and Isabelle Sagnes and R{\'e}my Braive and Alexios Beveratos and Izo Abram",

year = "2008",

month = jan,

day = "1",

doi = "10.1557/proc-1089-y03-01",

language = "English",

isbn = "9781605608761",

series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

pages = "7--16",

booktitle = "Materials Research Society Symposium Proceedings - Focused Ion Beams for Materials Characterization and Micromachining",

note = "Focused Ion Beams for Materials Characterization and Micromachining ; Conference date: 24-03-2008 Through 28-03-2008",

}

Gierak, J, Bourhis, E, Mailly, D, Patriarche, G, Madouri, A, Jede, R, Bauerdick, S, Bruchhaus, L, Hawkes, P, Biance, AL, Schiedt, B, Auvray, L, Bardotti, L, Prevel, B, Mélinon, P, Perez, A, Ferré, J, Jamet, JP, Mougin, A, Chappert, C, Mathet, V, Aigouy, L, Robert-Philip, I, Sagnes, I, Braive, R, Beveratos, A & Abram, I 2008, Exploration of the ultimate patterning potential achievable with focused ion beams. Dans Materials Research Society Symposium Proceedings - Focused Ion Beams for Materials Characterization and Micromachining. Materials Research Society Symposium Proceedings, VOL. 1089, Materials Research Society, p. 7-16, Focused Ion Beams for Materials Characterization and Micromachining, San Francisco, CA, États-Unis, 24/03/08. https://doi.org/10.1557/proc-1089-y03-01

Exploration of the ultimate patterning potential achievable with focused ion beams. / Gierak, Jacques; Bourhis, Eric; Mailly, Dominique et al.
Materials Research Society Symposium Proceedings - Focused Ion Beams for Materials Characterization and Micromachining. Materials Research Society, 2008. p. 7-16 (Materials Research Society Symposium Proceedings; Vol 1089).

Résultats de recherche: Le chapitre dans un livre, un rapport, une anthologie ou une collection › Contribution à une conférence › Revue par des pairs

TY - GEN

T1 - Exploration of the ultimate patterning potential achievable with focused ion beams

AU - Gierak, Jacques

AU - Bourhis, Eric

AU - Mailly, Dominique

AU - Patriarche, Gilles

AU - Madouri, Ali

AU - Jede, Ralf

AU - Bauerdick, Sven

AU - Bruchhaus, Lars

AU - Hawkes, Peter

AU - Biance, Anne Laure

AU - Schiedt, Birgitta

AU - Auvray, Loïc

AU - Bardotti, Laurent

AU - Prevel, Brigitte

AU - Mélinon, Pascal

AU - Perez, Alain

AU - Ferré, Jacques

AU - Jamet, Jean Pierre

AU - Mougin, Alexandra

AU - Chappert, Claude

AU - Mathet, Veronique

AU - Aigouy, Lionel

AU - Robert-Philip, Isabelle

AU - Sagnes, Isabelle

AU - Braive, Rémy

AU - Beveratos, Alexios

AU - Abram, Izo

PY - 2008/1/1

Y1 - 2008/1/1

N2 - In this work we aim at evaluating the nano-structuring potential of a highly Focused Ion Beam. We will first detail a very high resolution FIB instrument we have developed. Then we will introduce and illustrate some advanced FIB processing schemes explored with this instrument. These patterning schemes are (i) Artificial nanopores direct engraving. (ii) Local defect injection for magnetic thin film direct patterning. (iii) Functionalization of atomically clean graphite surfaces. (iv) Engineering of the optical properties of microcavities.

AB - In this work we aim at evaluating the nano-structuring potential of a highly Focused Ion Beam. We will first detail a very high resolution FIB instrument we have developed. Then we will introduce and illustrate some advanced FIB processing schemes explored with this instrument. These patterning schemes are (i) Artificial nanopores direct engraving. (ii) Local defect injection for magnetic thin film direct patterning. (iii) Functionalization of atomically clean graphite surfaces. (iv) Engineering of the optical properties of microcavities.

UR - https://www.scopus.com/pages/publications/70449638270

U2 - 10.1557/proc-1089-y03-01

DO - 10.1557/proc-1089-y03-01

M3 - Conference contribution

AN - SCOPUS:70449638270

SN - 9781605608761

T3 - Materials Research Society Symposium Proceedings

SP - 7

EP - 16

BT - Materials Research Society Symposium Proceedings - Focused Ion Beams for Materials Characterization and Micromachining

PB - Materials Research Society

T2 - Focused Ion Beams for Materials Characterization and Micromachining

Y2 - 24 March 2008 through 28 March 2008

ER -

Gierak J, Bourhis E, Mailly D, Patriarche G, Madouri A, Jede R et al. Exploration of the ultimate patterning potential achievable with focused ion beams. Dans Materials Research Society Symposium Proceedings - Focused Ion Beams for Materials Characterization and Micromachining. Materials Research Society. 2008. p. 7-16. (Materials Research Society Symposium Proceedings). doi: 10.1557/proc-1089-y03-01

Exploration of the ultimate patterning potential achievable with focused ion beams

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Une conférence

Accès au document

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