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Growth and characterization of aligned carbon nanotubes from patterned nickel nanodots and uniform thin films

  • J. G. Wen
  • , Z. P. Huang
  • , D. Z. Wang
  • , J. H. Chen
  • , S. X. Yang
  • , Z. F. Ren
  • , J. H. Wang
  • , L. E. Calvet
  • , J. Chen
  • , J. F. Klemic
  • , M. A. Reed
  • Boston College
  • University at Buffalo, The State University of New York
  • Yale University

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

Microstructures of well-aligned multiwall carbon nanotubes grown on patterned nickel nanodots and uniform thin films by plasma-enhanced chemical vapor deposition have been studied by electron microscopy. It was found that growth of carbon nanotubes on patterned nickel nanodots and uniform thin films is different. During growth of carbon nanotubes, a nickel particle sits at the tip of each nanotube, and its [220] is preferentially oriented along the plasma direction, which can be explained by a channeling effect of ions coming into nickel particles in plasma. The alignment of nanotubes is induced by the electrical field direction relative to substrate surface.

langue originaleAnglais
Pages (de - à)3246-3253
Nombre de pages8
journalJournal of Materials Research
Volume16
Numéro de publication11
Les DOIs
étatPublié - 1 janv. 2001
Modification externeOui

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