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Handling the carbon contamination issue at SOLEIL

  • I. Yao-Leclerc
  • , S. Brochet
  • , C. Chauvet
  • , N. De Oliveira
  • , J. P. Duval
  • , J. F. Gil
  • , S. Kubsky
  • , B. Lagarde
  • , L. Nahon
  • , F. Nicolas
  • , M. Silly
  • , F. Sirotti
  • , M. Thomasset
  • Synchrotron SOLEIL
  • Vacuum Group
  • Optical Group
  • TEMPO Beamline
  • DESIRS Beamline
  • Surfaces Lab

Résultats de recherche: Le chapitre dans un livre, un rapport, une anthologie ou une collection › Contribution à une conférence › Revue par des pairs

12 Citations (Scopus)

Résumé

Before the first photon beam was delivered at the SOLEIL synchrotron, scientists tried to anticipate the problem of carbon contamination on optical components, with for instance the outgasing of chambers by prior exposure to the beam with dummy optics. In spite of these efforts, deterioration of optical performance by carbon contamination has remained an outstanding issue: on the low-energy beamlines at SOLEIL. For example, carbon contamination results in significant photons flux losses (practically at the Carbon K edges), and modifications of the horizontal-to-vertical polarization transmission ratio, which degrade with time as the thickness of the carbon layer builds up. This contamination is visible and consists of a gray/black line over the entire photon beam footprint. Addressing the carbon contamination issue, two cleaning processes have been tested quite successfully on two SOLEIL beamlines (in the UV-VUV and soft X-ray ranges), namely in-situ oxygen plasma and in-situ ozone generation via UV lamps. A dedicated group is currently working on the improvement of the cleaning processes, the metrology of the optics before and after cleaning and the study of the carbon coating in order to propose possible strategies to prevent or slow down the contamination process.

langue originaleAnglais
titreDamage to VUV, EUV, and X-Ray Optics III
Les DOIs
étatPublié - 25 juil. 2011
Modification externeOui
EvénementDamage to VUV, EUV, and X-Ray Optics III - Prague, République tchcque
Durée: 18 avr. 2011 → 20 avr. 2011

Série de publications

NomProceedings of SPIE - The International Society for Optical Engineering
Volume8077
ISSN (imprimé)0277-786X

Une conférence

Une conférenceDamage to VUV, EUV, and X-Ray Optics III
Pays/TerritoireRépublique tchcque
La villePrague
période18/04/11 → 20/04/11

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