Résumé
We demonstrate that room temperature electroluminescence can be obtained from n-doped germanium layers by using a Schottky contact. The electrical and optical properties of the Schottky device are improved by inserting a thin Al2O3 interfacial barrier. We also show that high active doping of Ge grown on Si can be obtained by molecular beam epitaxy by using a co-doping method with Sb and P. We finally discuss the transfer of tensile strain on microdisk resonators using silicon nitride stressor layers.
| langue originale | Anglais |
|---|---|
| Pages (de - à) | 359-364 |
| Nombre de pages | 6 |
| journal | ECS Transactions |
| Volume | 64 |
| Numéro de publication | 6 |
| Les DOIs | |
| état | Publié - 1 janv. 2014 |
| Evénement | 6th SiGe, Ge, and Related Compounds: Materials, Processing and Devices Symposium - 2014 ECS and SMEQ Joint International Meeting - Cancun, Mexique Durée: 5 oct. 2014 → 9 oct. 2014 |
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