Résumé
We report on the use of in situ infrared spectroscopy for monitoring the electrodeposition of metals on semiconductors. The deposit is modelled as a slice of an effective medium consisting of a mixture of the deposited metal and the electrolyte, and the infrared absorption is fitted using Bruggeman's and Bergman's effective medium theories. In the case of Ag deposition on Si, this analysis brings information not only on the amount of deposited metal but also on the morphology of the deposit, as confirmed by ex situ SEM observations. In situ monitoring of the morphology provides a means for realizing surface enhanced infrared absorption geometry with electrodeposited metal islets.
| langue originale | Anglais |
|---|---|
| Pages (de - à) | 193-198 |
| Nombre de pages | 6 |
| journal | Vibrational Spectroscopy |
| Volume | 19 |
| Numéro de publication | 2 |
| Les DOIs | |
| état | Publié - 1 janv. 1999 |
| Evénement | Proceedings of the 1998 3rd International Symposium on Advanced Infrared and Raman Spectroscopy, AIRS III - Vienna, Autriche Durée: 5 juil. 1998 → 9 juil. 1998 |
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