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In-situ infrared kinetic study of multistep chemical modifications of organic monolayers at silicon surfaces

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Résumé

The reaction of activation of acid-terminated organic monolayers grafted on (111)Si surfaces into succinimidyl-ester terminated monolayers by treatment in N-ethyl-N'-(3-dimethylaminopropyl)-carbodiimide (EDC) and N-hydroxysuccinimide (NHS) has been studied by infrared spectroscopy and its kinetics have been followed in situ. The reaction exhibits non exponential kinetics, with an initial fast rise in the appearance of succinimidyl ester followed by a long reaction tail. The origin of this behavior can be ascribed either to the existence of a fast reaction pathway involving anhydride formation, or to the rate limitation by steric hindrance effects. The subsequent amidation of the succinimidyl ester layers by a primary amine has been studied similarly. Here, the kinetics are found to be exponential, but the reaction rate exhibits a sublinear dependence on the amine concentration. This behavior is ascribed to the effects of electrostatic interactions on the adsorption of the protonated amine onto the Si surface prior to reaction.

langue originaleAnglais
titreECS Transactions - State-of-the-Art Program on Compound Semiconductors 50 (SOTAPOCS 50)and Processes at the Semiconductor Solution Interface 3
EditeurElectrochemical Society Inc.
Pages283-292
Nombre de pages10
Edition3
ISBN (Electronique)9781607680611
ISBN (imprimé)9781566777117
Les DOIs
étatPublié - 1 janv. 2009
Evénement50th State-of-the-Art Symposium on Compound Semiconductors, SOTAPOCS 50 and 3rd International Symposium on Processes at the Semiconductor-Solution Interface, PSSI 3 - 215th ECS Meeting - San Francisco, CA, États-Unis
Durée: 24 mai 2009 → 29 mai 2009

Série de publications

NomECS Transactions
nombre3
Volume19
ISSN (imprimé)1938-5862
ISSN (Electronique)1938-6737

Une conférence

Une conférence50th State-of-the-Art Symposium on Compound Semiconductors, SOTAPOCS 50 and 3rd International Symposium on Processes at the Semiconductor-Solution Interface, PSSI 3 - 215th ECS Meeting
Pays/TerritoireÉtats-Unis
La villeSan Francisco, CA
période24/05/09 → 29/05/09

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