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Interface defects in a-Si:H/c-Si heterojunction solar cells

  • Université Paris-Sud
  • Institut polytechnique de Paris
  • Total

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

The ability to incorporate a low concentration of defects at different near-surface or interface locations in a silicon heterojunction solar cell is reported here using argon ion implantation. Optical properties of the irradiated layers are addressed using spectroscopic ellipsometry while non-radiative recombinations through defects are addressed using photoconductance and photoluminescence measurements. Low energy ion irradiation at 1 keV under fluences up to 7 × 1013 cm-2 induces no cell degradation while higher ion energies associated to larger penetration depths close to the amorphous/crystalline interface show increased degradation with ion fluence. This behavior allows to estimate some interface defect concentration threshold for cell degradation.

langue originaleAnglais
Pages (de - à)133-136
Nombre de pages4
journalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume365
Les DOIs
étatPublié - 15 déc. 2015

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