Résumé
The ability to incorporate a low concentration of defects at different near-surface or interface locations in a silicon heterojunction solar cell is reported here using argon ion implantation. Optical properties of the irradiated layers are addressed using spectroscopic ellipsometry while non-radiative recombinations through defects are addressed using photoconductance and photoluminescence measurements. Low energy ion irradiation at 1 keV under fluences up to 7 × 1013 cm-2 induces no cell degradation while higher ion energies associated to larger penetration depths close to the amorphous/crystalline interface show increased degradation with ion fluence. This behavior allows to estimate some interface defect concentration threshold for cell degradation.
| langue originale | Anglais |
|---|---|
| Pages (de - à) | 133-136 |
| Nombre de pages | 4 |
| journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
| Volume | 365 |
| Les DOIs | |
| état | Publié - 15 déc. 2015 |
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