Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma

J. P. Booth; G. Hancock; N. D. Perry

doi:10.1063/1.98214

Laser induced fluorescence detection of CF and CF₂ radicals in a CF₄/O₂ plasma

J. P. Booth
, G. Hancock
, N. D. Perry

University of Oxford

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

62 Citations (Scopus)

Résumé

Laser induced fluorescence has been used to detect ground-state CF and CF₂ radicals in a CF₄/O₂ plasma etching reactor. Measurements are reported of the spatial variation of CF₂ concentrations, of the CF radical rotational state distributions, and of the variation of both species with O₂ content of the plasma.

langue originale	Anglais
Pages (de - à)	318-319
Nombre de pages	2
journal	Applied Physics Letters
Volume	50
Numéro de publication	6
Les DOIs	https://doi.org/10.1063/1.98214
état	Publié - 1 déc. 1987
Modification externe	Oui

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10.1063/1.98214

Contient cette citation

@article{198dff99dae646c2adff0ebf4ac7f7dd,

title = "Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma",

abstract = "Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of the plasma.",

author = "Booth, \{J. P.\} and G. Hancock and Perry, \{N. D.\}",

year = "1987",

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doi = "10.1063/1.98214",

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journal = "Applied Physics Letters",

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T1 - Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma

AU - Booth, J. P.

AU - Hancock, G.

AU - Perry, N. D.

PY - 1987/12/1

Y1 - 1987/12/1

N2 - Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of the plasma.

AB - Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plasma etching reactor. Measurements are reported of the spatial variation of CF2 concentrations, of the CF radical rotational state distributions, and of the variation of both species with O2 content of the plasma.

U2 - 10.1063/1.98214

DO - 10.1063/1.98214

M3 - Article

AN - SCOPUS:0001093529

SN - 0003-6951

VL - 50

SP - 318

EP - 319

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 6

ER -

Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma

Résumé

Accès au document

Empreinte digitale

Contient cette citation

Laser induced fluorescence detection of CF and CF₂ radicals in a CF₄/O₂ plasma