Résumé
The behavior of ortho-positronium (o-Ps) in mesoporous silica films implanted with low-energy positrons has been studied as a function of the film porous volume fraction. A lifetime spectrometer allowed determination of o-Ps annihilation decay both inside and outside of the film. A kinetic model is introduced that permits the determination of the yield and rate of escape of o-Ps into vacuum as well as the annihilation decay rate of the trapped o-Ps in the film. It is shown that these undergo a sudden change at a threshold porous volume fraction, above which the o-Ps escape rate to vacuum varies linearly with volume fraction.
| langue originale | Anglais |
|---|---|
| Numéro d'article | 124103 |
| journal | Applied Physics Letters |
| Volume | 95 |
| Numéro de publication | 12 |
| Les DOIs | |
| état | Publié - 1 janv. 2009 |
| Modification externe | Oui |
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