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Mesoporous silica films with varying porous volume fraction: Direct correlation between ortho-positronium annihilation decay and escape yield into vacuum

  • L. Liszkay
  • , C. Corbel
  • , L. Raboin
  • , J. P. Boilot
  • , P. Perez
  • , A. Brunet-Bruneau
  • , P. Crivelli
  • , U. Gendotti
  • , A. Rubbia
  • , T. Ohdaira
  • , R. Suzuki
  • Universite Paris-Saclay
  • Wigner Research Centre for Physics
  • CNRS, UMR 7588, INSP
  • ETH Zurich
  • URFJ
  • National Institute of Advanced Industrial Science and Technology

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

The behavior of ortho-positronium (o-Ps) in mesoporous silica films implanted with low-energy positrons has been studied as a function of the film porous volume fraction. A lifetime spectrometer allowed determination of o-Ps annihilation decay both inside and outside of the film. A kinetic model is introduced that permits the determination of the yield and rate of escape of o-Ps into vacuum as well as the annihilation decay rate of the trapped o-Ps in the film. It is shown that these undergo a sudden change at a threshold porous volume fraction, above which the o-Ps escape rate to vacuum varies linearly with volume fraction.

langue originaleAnglais
Numéro d'article124103
journalApplied Physics Letters
Volume95
Numéro de publication12
Les DOIs
étatPublié - 1 janv. 2009
Modification externeOui

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