Passer à la navigation principale Passer à la recherche Passer au contenu principal

Metallization of warm dense SiO2 studied by xanes spectroscopy

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

We investigate the evolution of the electronic structure of fused silica in a dense plasma regime using time-resolved x-ray absorption spectroscopy. We use a nanosecond (ns) laser beam to generate a strong uniform shock wave in the sample and a picosecond (ps) pulse to produce a broadband x-ray source near the Si K edge. By varying the delay between the two laser beams and the intensity of the ns beam, we explore a large thermodynamical domain with densities varying from 1 to 5g/cm3 and temperatures up to 5 eV. In contrast to normal conditions where silica is a well-known insulator with a wide band gap of 8.9 eV, we find that shocked silica exhibits a pseudogap as a semimetal throughout this thermodynamical domain. This is in quantitative agreement with density functional theory predictions performed using the generalized gradient approximation.

langue originaleAnglais
Numéro d'article116404
journalPhysical Review Letters
Volume113
Numéro de publication11
Les DOIs
étatPublié - 12 sept. 2014

Empreinte digitale

Examiner les sujets de recherche de « Metallization of warm dense SiO2 studied by xanes spectroscopy ». Ensemble, ils forment une empreinte digitale unique.

Contient cette citation