Narrow-band acoustic attenuation measurements in vitreous silica at frequencies between 20 and 400 GHz

C. Klieber; E. Peronne; K. Katayama; J. Choi; M. Yamaguchi; T. Pezeril; Keith A. Nelson

doi:10.1063/1.3595275

Narrow-band acoustic attenuation measurements in vitreous silica at frequencies between 20 and 400 GHz

C. Klieber
, E. Peronne
, K. Katayama
, J. Choi
, M. Yamaguchi
, T. Pezeril
, Keith A. Nelson

Department of Chemistry
Massachusetts Institute of Technology
CNRS, UMR 7588, INSP
Dept. Appl. Chem.
Chuo University
Dept. of Physics
Rensselaer Polytechnic Institute
Le Mans Université

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

48 Citations (Scopus)

Résumé

Acoustic attenuation rates in vitreous silica in the 20-400 GHz frequency range have been measured using a multiple-pulse optical technique for generation of tunable multicycle acoustic waves that are detected interferometrically after traversal of the sample. The results connect the frequency ranges of several measurement methods, yielding a consistent description of the acoustic behavior.

langue originale	Anglais
Numéro d'article	211908
journal	Applied Physics Letters
Volume	98
Numéro de publication	21
Les DOIs	https://doi.org/10.1063/1.3595275
état	Publié - 23 mai 2011
Modification externe	Oui

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10.1063/1.3595275

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title = "Narrow-band acoustic attenuation measurements in vitreous silica at frequencies between 20 and 400 GHz",

abstract = "Acoustic attenuation rates in vitreous silica in the 20-400 GHz frequency range have been measured using a multiple-pulse optical technique for generation of tunable multicycle acoustic waves that are detected interferometrically after traversal of the sample. The results connect the frequency ranges of several measurement methods, yielding a consistent description of the acoustic behavior.",

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AU - Klieber, C.

AU - Peronne, E.

AU - Katayama, K.

AU - Choi, J.

AU - Yamaguchi, M.

AU - Pezeril, T.

AU - Nelson, Keith A.

PY - 2011/5/23

Y1 - 2011/5/23

N2 - Acoustic attenuation rates in vitreous silica in the 20-400 GHz frequency range have been measured using a multiple-pulse optical technique for generation of tunable multicycle acoustic waves that are detected interferometrically after traversal of the sample. The results connect the frequency ranges of several measurement methods, yielding a consistent description of the acoustic behavior.

AB - Acoustic attenuation rates in vitreous silica in the 20-400 GHz frequency range have been measured using a multiple-pulse optical technique for generation of tunable multicycle acoustic waves that are detected interferometrically after traversal of the sample. The results connect the frequency ranges of several measurement methods, yielding a consistent description of the acoustic behavior.

U2 - 10.1063/1.3595275

DO - 10.1063/1.3595275

M3 - Article

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JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 21

M1 - 211908

ER -

Narrow-band acoustic attenuation measurements in vitreous silica at frequencies between 20 and 400 GHz

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