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New Techniques For The Measurement of X-Ray Beam or X-Ray Optics Quality

  • Ph Zeitoun
  • , Ph Balcou
  • , S. Bucourt
  • , D. Benredjem
  • , F. Delmotte
  • , G. Dovillaire
  • , D. Douillet
  • , J. Dunn
  • , G. Faivre
  • , M. Fajardo
  • , K. A. Goldberg
  • , M. Idir
  • , S. Hubert
  • , J. R. Hunter
  • , S. Jacquemot
  • , S. Kazamias
  • , S. Le Pape
  • , X. Levecq
  • , C. L.S. Lewis
  • , R. Marmoret
  • P. Mercère, A. S. Morlens, P. P. Naulleau, C. Rémond, J. J. Rocca, S. Sebban, R. F. Smith, M. F. Ravet, P. Troussel, C. Valentin, L. Vanbostal
  • Université Paris-Saclay
  • Laboratory d'Optique Appliquée, ENSTA, CNRS-École Polytechnique
  • Imagine Optic
  • Laboratoire Charles Fabry
  • Lawrence Livermore National Laboratory
  • Ernest Orlando Lawrence Berkeley National Laboratory
  • Centre d'Etudes de Limeil-Valenton
  • Queen's University of Belfast
  • Colorado State University

Résultats de recherche: Contribution à un journalArticle de conférenceRevue par des pairs

Résumé

Metrology of XUV beams and more specifically X-ray laser (XRL) beam is of crucial importance for development of applications. We have then developed several new optical systems enabling to measure the x-ray laser optical properties. By use of a Michelson interferometer working as a Fourier-Transform spectrometer, the line shapes of different x-ray lasers have been measured with an unprecedented accuracy (δλ/λ∼10-6). Achievement of the first XUV wavefront sensor has enable to measure the beam quality of laser-pumped as well as discharge pumped x-ray lasers. Capillary discharge XRL has demonstrated a very good wavefront allowing to achieve intensity as high 3*1014 Wcm-2 by focusing with a f = 5 cm mirror. The measured sensor accuracy is as good as λ/120 at 13 nm. Commercial developments are under way.

langue originaleAnglais
Pages (de - à)194-204
Nombre de pages11
journalProceedings of SPIE - The International Society for Optical Engineering
Volume5197
Les DOIs
étatPublié - 1 janv. 2003
Modification externeOui
EvénementSoft X-Ray Lasers and Applications V - San Diego, CA, États-Unis
Durée: 6 août 20037 août 2003

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