Résumé
The Stark splitting of a single fourfold degenerate impurity located within the built-in potential of a metal-semiconductor contact is investigated using low temperature transport measurements. A model is developed and used to analyze transport as a function of temperature, bias voltage, and magnetic field. Our data is consistent with a boron impurity. We report g factors of g1/2=1.14 and g3/2=1.72 and a linear Stark splitting 2Δ of 0.1 meV.
| langue originale | Anglais |
|---|---|
| Numéro d'article | 096805 |
| journal | Physical Review Letters |
| Volume | 98 |
| Numéro de publication | 9 |
| Les DOIs | |
| état | Publié - 2 mars 2007 |
| Modification externe | Oui |
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