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Optical emission spectroscopy of various materials irradiated by soft x-ray free-electron laser

  • J. Cihelka
  • , L. Juha
  • , J. Chalupský
  • , F. B. Rosmej
  • , O. Renner
  • , K. Saksl
  • , V. Hájková
  • , L. Vyšín
  • , E. Galtier
  • , R. Schott
  • , A. R. Khorsand
  • , D. Riley
  • , T. Dzelzainis
  • , A. J. Nelson
  • , R. W. Lee
  • , P. A. Heimann
  • , B. Nagler
  • , S. Vinko
  • , J. Wark
  • , T. Whitcher
  • S. Toleikis, T. Tschentscher, R. Fäustlin, H. Wabnitz, S. Bajt, H. Chapman, J. Krzywinski, R. Sobierajski, D. Klinger, M. Jurek, J. Pelka, S. Hau-Riege, R. A. London, J. Kuba, N. Stojanovic, K. Sokolowski-Tinten, A. J. Gleeson, M. Störmer, J. Andreasson, J. Hajdu, B. Iwan, N. Timneanu
  • Institute of Physics of the Czech Academy of Sciences
  • J.Heyrovsky Inst. Phys. Chem. E.
  • Czech Technical University in Prague
  • Institute of Materials Research SAS
  • Sorbonne Université
  • Association EURATOM-FOM
  • Lawrence Livermore National Laboratory
  • Ernest Orlando Lawrence Berkeley National Laboratory
  • University of Oxford
  • c/o DESY
  • Stanford Linear Accelerator Center
  • Institute of Physics of the Polish Academy of Sciences
  • University of Duisburg-Essen
  • STFC Daresbury Laboratory
  • Helmholtz-Zentrum Hereon GmbH
  • Uppsala University

Résultats de recherche: Le chapitre dans un livre, un rapport, une anthologie ou une collectionContribution à une conférenceRevue par des pairs

5 Citations (Scopus)

Résumé

The beam of the Free-Electron Laser in Hamburg (FLASH) was focused by a grazing incidence elliptical mirror (32.5 nm and 13.5 nm) and an off-axis parabolic mirror coated with a Si/Mo multilayer (13.5 nm) to 20-micron and 1-micron spot, respectively. The grazing incidence and normal incidence focusing of ∼25-fs pulses with an energy of 10 μJ resulted in an irradiance of 1013 W/cm2 and 1016 W/cm2, respectively, at the surface of various solids (Si, Al, Ti, Ta, Si 3N4, BN, a-C/Si, Ni/Si, Cr/Si, Rh/Si, Ce:YAG, poly(methyl methacrylate) - PMMA, stainless steel, etc.). The optical emission of the plasmas produced under these conditions was registered by a grating (1200 lines/mm and/or 150 lines/mm) spectrometer MS257 (Oriel) equipped with iCCD head (iStar 720, Andor). Surprisingly, only lines belonging to the neutral atoms were observed at intensities around 1013 W/cm2. No spectral lines of ions have been identified in UV-vis spectra emitted from the plasmas formed by the FLASH beam focused in a 20-micron spot. At intensities around 1016 W/cm2, the OE spectra are again dominated by the atomic lines. However, a weak emission of Al+ and Al2+ was registered as well. The abundance ratio of Al/Al+ should be at least 100. The plasma has an excitation temperature equivalent to 0.8 eV found by a computer simulation of the aluminum plasma OE spectrum. A broadband emission was also registered, both from the single-element plasmas (typical is for carbon; there were no spectral lines) and the scintillating slabs (on Ce:YAG crystal, both the luminescence bands and the line plasma emission were recorded by the spectrometer).

langue originaleAnglais
titreDamage to VUV, EUV, and X-Ray Optics II
Les DOIs
étatPublié - 14 sept. 2009
EvénementDamage to VUV, EUV, and X-Ray Optics II - Prague, République tchcque
Durée: 21 avr. 200923 avr. 2009

Série de publications

NomProceedings of SPIE - The International Society for Optical Engineering
Volume7361
ISSN (imprimé)0277-786X

Une conférence

Une conférenceDamage to VUV, EUV, and X-Ray Optics II
Pays/TerritoireRépublique tchcque
La villePrague
période21/04/0923/04/09

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