Résumé
The changes in the optical and electrical properties of thick a-Si:H and a-SiC:H films doped with diborane are investigated. In situ spectroscopic ellipsometry measurements reveal that, at a ratio of diborane to silane Cg = [B2H6]/[SiH4]<10-3. the optical properties of both materials are not strongly modified by boron doping. However, in the case of a-Si:H films, an improvement of the morphological and optical properties is observed at Cg = 0.45×10-3. The existence of an optimum doping level at Cg<10-3 in the case of an a-Si:H p layer is confirmed by the dependence of the open-circuit voltage of a-Si:H based solar cells on the doping level of the p layer,
| langue originale | Anglais |
|---|---|
| Pages (de - à) | 830-836 |
| Nombre de pages | 7 |
| journal | Journal of Applied Physics |
| Volume | 83 |
| Numéro de publication | 2 |
| Les DOIs | |
| état | Publié - 15 janv. 1998 |
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