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Orthopositronium annihilation and emission in mesostructured thin silica and silicalite-1 films

  • L. Liszkay
  • , M. F. Barthe
  • , C. Corbel
  • , P. Crivelli
  • , P. Desgardin
  • , M. Etienne
  • , T. Ohdaira
  • , P. Perez
  • , R. Suzuki
  • , V. Valtchev
  • , A. Walcarius
  • Universite Paris-Saclay
  • CNRS-CEMHTI
  • CEA/UVSQ/CNRS
  • Institut für Teilchenphysik
  • ETH Zurich
  • CNRS-Nancy-Universit́
  • National Institute of Advanced Industrial Science and Technology
  • ENSCMu École Nationale Supérieure de Chimie de Mulhouse

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

15 Citations (Scopus)

Résumé

Mesoporous silica films and MFI-type pure silica zeolite films were investigated using slow positrons. Detection of the 3γ annihilation fraction was used as a quick test to estimate the emission of orthopositronium (o-Ps) into vacuum. Positronium time-of-flight (TOF) spectroscopy, combined with Monte-Carlo simulation of the detection system was used to determine the energy of o-Ps emitted from the films. Evidence for an efficient o-Ps emission was found in both the mesoporous and silicalite-1. A 3γ fraction in the range of 31-36 % was found in the films with the highest o-Ps yield in each type of porous material, indicating that 40-50 % of the implanted positrons form positronium in the pore systems with very different pore sizes. Time-of-flight measurements showed that the energy of the orthopositronium emitted into vacuum is below 100 meV in the film with 2-3 nm pores at 3 keV positron energy, indicating an efficient slowing down but no complete thermalization in the porous films of 300-400 nm thickness.

langue originaleAnglais
Pages (de - à)187-190
Nombre de pages4
journalApplied Surface Science
Volume255
Numéro de publication1
Les DOIs
étatPublié - 31 oct. 2008
Modification externeOui

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