Partial crystallization of an amorphous alloy by electronic energy deposition

A. Dunlop; G. Jaskierowicz; G. Rizza; M. Kopcewicz

Partial crystallization of an amorphous alloy by electronic energy deposition

A. Dunlop
, G. Jaskierowicz
, G. Rizza
, M. Kopcewicz

Laboratoire des Solides Irradiés
Łukasiewicz Research Network - Institute of Microelectronics and Photonics

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

38 Citations (Scopus)

Résumé

Low temperature irradiation of an amorphous Fe_73.5Cu₁Nb₃Si_13.5B₉ alloy with 5 GeV Pb ions was studied and found to induce local crystallization in the amorphous phase. TEM analysis revealed the formation of iron borides. No evidence for the formation of the Fe(Si) phase was found. Crystallization resulted from the local relaxation of the energy deposited in the target electronic system along the ion trajectory.

langue originale	Anglais
Numéro d'article	015503
Pages (de - à)	015503/1-015503/4
journal	Physical Review Letters
Volume	90
Numéro de publication	1
état	Publié - 10 janv. 2003

Contient cette citation

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title = "Partial crystallization of an amorphous alloy by electronic energy deposition",

abstract = "Low temperature irradiation of an amorphous Fe73.5Cu1Nb3Si13.5B9 alloy with 5 GeV Pb ions was studied and found to induce local crystallization in the amorphous phase. TEM analysis revealed the formation of iron borides. No evidence for the formation of the Fe(Si) phase was found. Crystallization resulted from the local relaxation of the energy deposited in the target electronic system along the ion trajectory.",

author = "A. Dunlop and G. Jaskierowicz and G. Rizza and M. Kopcewicz",

year = "2003",

month = jan,

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language = "English",

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T1 - Partial crystallization of an amorphous alloy by electronic energy deposition

AU - Dunlop, A.

AU - Jaskierowicz, G.

AU - Rizza, G.

AU - Kopcewicz, M.

PY - 2003/1/10

Y1 - 2003/1/10

N2 - Low temperature irradiation of an amorphous Fe73.5Cu1Nb3Si13.5B9 alloy with 5 GeV Pb ions was studied and found to induce local crystallization in the amorphous phase. TEM analysis revealed the formation of iron borides. No evidence for the formation of the Fe(Si) phase was found. Crystallization resulted from the local relaxation of the energy deposited in the target electronic system along the ion trajectory.

AB - Low temperature irradiation of an amorphous Fe73.5Cu1Nb3Si13.5B9 alloy with 5 GeV Pb ions was studied and found to induce local crystallization in the amorphous phase. TEM analysis revealed the formation of iron borides. No evidence for the formation of the Fe(Si) phase was found. Crystallization resulted from the local relaxation of the energy deposited in the target electronic system along the ion trajectory.

M3 - Article

AN - SCOPUS:0037427973

SN - 0031-9007

VL - 90

SP - 015503/1-015503/4

JO - Physical Review Letters

JF - Physical Review Letters

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M1 - 015503

ER -

Partial crystallization of an amorphous alloy by electronic energy deposition

Résumé

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