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Plasma devices for focusing extreme light pulses

  • J. Fuchs
  • , A. A. Gonoskov
  • , M. Nakatsutsumi
  • , W. Nazarov
  • , F. Quéré
  • , A. M. Sergeev
  • , X. Q. Yan

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

Since the inception of the laser, there has been a constant push toward increasing the laser peak intensity, as this has lead to opening the exploration of new territories, and the production of compact sources of particles and radiation with unprecedented characteristics. However, increasing the peak laser intensity is usually performed by enhancing the produced laser properties, either by lowering its duration or increasing its energy, which involves a great level of complexity for the laser chain, or comes at great cost. Focusing tightly is another possibility to increase the laser intensity, but this comes at the risk of damaging the optics with target debris, as it requires their placement in close proximity to the interaction region. Plasma devices are an attractive, compact alternative to tightly focus extreme light pulses and further increase the final laser intensity.

langue originaleAnglais
Pages (de - à)1169-1173
Nombre de pages5
journalEuropean Physical Journal: Special Topics
Volume223
Numéro de publication6
Les DOIs
étatPublié - 1 janv. 2014
Modification externeOui

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