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Plasma emission spectroscopy of solids irradiated by intense XUV pulses from a free electron laser

  • T. W.J. Dzelzainis
  • , J. Chalupsky
  • , M. Fajardo
  • , R. Fäustlin
  • , P. A. Heimann
  • , V. Hajkova
  • , L. Juha
  • , M. Jurek
  • , F. Y. Khattak
  • , M. Kozlova
  • , J. Krzywinski
  • , R. W. Lee
  • , B. Nagler
  • , A. J. Nelson
  • , F. B. Rosmej
  • , R. Soberierski
  • , S. Toleikis
  • , T. Tschentscher
  • , S. M. Vinko
  • , J. S. Wark
  • T. Whitcher, D. Riley
  • Queen's University of Belfast
  • Institute of Physics of the Czech Academy of Sciences
  • Instituto Superior Técnico
  • c/o DESY
  • Ernest Orlando Lawrence Berkeley National Laboratory
  • Kohat University of Science and Technology (KUST)
  • Stanford Linear Accelerator Center
  • Lawrence Livermore National Laboratory
  • University of Oxford
  • Laboratory of Molecular Neurobiology

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

6 Citations (Scopus)

Résumé

The FLASH XUV-free electron laser has been used to irradiate solid samples at intensities of the order 1016 W cm-2 at a wavelength of 13.5 nm. The subsequent time integrated XUV emission was observed with a grating spectrometer. The electron temperature inferred from plasma line ratios was in the range 5-8 eV with electron density in the range 1021-1022 cm-3. These results are consistent with the saturation of absorption through bleaching of the L-edge by intense photo-absorption reported in an earlier publication.

langue originaleAnglais
Pages (de - à)109-112
Nombre de pages4
journalHigh Energy Density Physics
Volume6
Numéro de publication1
Les DOIs
étatPublié - 1 janv. 2010

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