Résumé
Hydrogenated polymorphous Silicon allows to fabricate TFTs with very interesting characteristics including better threshold voltage stability than a-Si TFTs, lower leakage current than μ-Si:H TFTs and excellent uniformity. Investigation of threshold voltage shift mechanisms of pm-Si:H TFTs has shown a specific semiconductor material degradation with different activation energies compared to a-Si:H TFTs. TEM analysis has evidenced for the first time a significant structural difference between pm-Si:H and a-Si:H materials, in the TFT device configuration. Pm-Si:H appears to be very suitable for low cost and high performance AM-OLED fabrication.
| langue originale | Anglais |
|---|---|
| Pages (de - à) | 1490-1494 |
| Nombre de pages | 5 |
| journal | IEICE Transactions on Electronics |
| Volume | E93-C |
| Numéro de publication | 10 |
| Les DOIs | |
| état | Publié - 1 janv. 2010 |
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