Passer à la navigation principale Passer à la recherche Passer au contenu principal

Positron mobility in Si at 300 K

  • J. Mäkinen
  • , C. Corbel
  • , P. Hautojärvi
  • , A. Vehanen
  • , D. Mathiot
  • Aalto University
  • Orange Labs

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

Positron motion in an electric field is studied experimentally by measuring the drift length of positrons in the space-charge region of a Au-Si surface-barrier diode. An electric field of the order of 104 V/cm gives rise to a drift length from 2 to 3 m. The drift-diffusion approximation can explain positron transport up to an electric-field strength of 3×104 V/cm. At 300 K we get a positron mobility of 120±10 cm2/V s in Czochralski-grown Si ([P]=7.4×1014 cm-3), and the diffusion coefficient calculated from the Einstein relation is 3.0±0.25 cm2/s. Positron diffusion was measured without preparing a metal-semiconductor contact in high-purity floating-zone Si (104 cm) assuming the electric field can be neglected. The diffusion coefficient is 3.10±0.20 cm2/s, in good agreement with that based upon the positron mobility measured under an electric field.

langue originaleAnglais
Pages (de - à)1750-1758
Nombre de pages9
journalPhysical Review B
Volume42
Numéro de publication3
Les DOIs
étatPublié - 1 janv. 1990
Modification externeOui

Empreinte digitale

Examiner les sujets de recherche de « Positron mobility in Si at 300 K ». Ensemble, ils forment une empreinte digitale unique.

Contient cette citation