Radiation hardening of silica glass through fictive temperature reduction

Matthieu Lancry; B. Hari Babu; Nadège Ollier; Bertrand Poumellec

doi:10.1111/ijag.12271

Radiation hardening of silica glass through fictive temperature reduction

Matthieu Lancry
, B. Hari Babu
, Nadège Ollier
, Bertrand Poumellec

Institut de Chimie Moléculaire et des Matériaux d'Orsay
Université Paris-Saclay

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

Résumé

The aim of this article was to report the effects of γ-radiation on type-I Infrasil silica glass with different fictive temperatures, T_f, for harsh environment applications. Radiation-induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E’ point defects, AlOHC, and hydrogen(II) defects in high T_f samples. In general, we find that the γ-radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.

langue originale	Anglais
Pages (de - à)	285-290
Nombre de pages	6
journal	International Journal of Applied Glass Science
Volume	8
Numéro de publication	3
Les DOIs	https://doi.org/10.1111/ijag.12271
état	Publié - 1 sept. 2017
Modification externe	Oui

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10.1111/ijag.12271

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@article{3139f8037a954c849b4b8239f372eafb,

title = "Radiation hardening of silica glass through fictive temperature reduction",

abstract = "The aim of this article was to report the effects of γ-radiation on type-I Infrasil silica glass with different fictive temperatures, Tf, for harsh environment applications. Radiation-induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E{\textquoteright} point defects, AlOHC, and hydrogen(II) defects in high Tf samples. In general, we find that the γ-radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.",

keywords = "defects, fiber materials, fictive temperature, radiation resistance, silica",

author = "Matthieu Lancry and Babu, \{B. Hari\} and Nad{\`e}ge Ollier and Bertrand Poumellec",

note = "Publisher Copyright: {\textcopyright} 2017 The American Ceramic Society and Wiley Periodicals, Inc",

year = "2017",

month = sep,

day = "1",

doi = "10.1111/ijag.12271",

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journal = "International Journal of Applied Glass Science",

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T1 - Radiation hardening of silica glass through fictive temperature reduction

AU - Lancry, Matthieu

AU - Babu, B. Hari

AU - Ollier, Nadège

AU - Poumellec, Bertrand

PY - 2017/9/1

Y1 - 2017/9/1

N2 - The aim of this article was to report the effects of γ-radiation on type-I Infrasil silica glass with different fictive temperatures, Tf, for harsh environment applications. Radiation-induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E’ point defects, AlOHC, and hydrogen(II) defects in high Tf samples. In general, we find that the γ-radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.

AB - The aim of this article was to report the effects of γ-radiation on type-I Infrasil silica glass with different fictive temperatures, Tf, for harsh environment applications. Radiation-induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E’ point defects, AlOHC, and hydrogen(II) defects in high Tf samples. In general, we find that the γ-radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.

KW - defects

KW - fiber materials

KW - fictive temperature

KW - radiation resistance

KW - silica

U2 - 10.1111/ijag.12271

DO - 10.1111/ijag.12271

M3 - Article

AN - SCOPUS:85017562508

SN - 2041-1286

VL - 8

SP - 285

EP - 290

JO - International Journal of Applied Glass Science

JF - International Journal of Applied Glass Science

IS - 3

ER -

Radiation hardening of silica glass through fictive temperature reduction

Résumé

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