Passer à la navigation principale Passer à la recherche Passer au contenu principal

Robust Ultra-Low Power Non-Volatile Logic-in-Memory Circuits in FD-SOI Technology

  • Université Paris-Saclay
  • Beihang University

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

100 Citations (Scopus)

Résumé

In the upcoming internet of things (IoT) era, spin transfer torque magnetic tunnel junction (STT-MTJ) based non-volatile (NV) memory and circuits for IoT nodes and normally-off electronics will need to meet constraints in speed, energy and robustness. This study focuses on NV logic-in-memory (LIM) architecture. Supply voltage (Vdd) scaling in MTJ based NV-LIM is evaluated on FD-SOI 28 nm node. In order to overcome Vdd scaling bottleneck, an efficient framework for Vdd scaling in NV circuits is proposed with design strategies, e.g., back-bias (BB), poly biasing (PB), and approximate computing. The design vector (Vdd, VBB,PB) generated power-delay curves can provide user-defined LIM circuit aiming for dynamic/leakage power saving, power/speed efficiency and process variation resilient. The design space is explored in near-threshold regime around 0.5 V supply. Simulations of NV-logic, full adder (NV-FA) and flip-flop (NV-FF) are performed, along with insights for circuit design and practical implementation of NV-LIM circuits with FD-SOI technology.

langue originaleAnglais
Numéro d'article7748536
Pages (de - à)847-857
Nombre de pages11
journalIEEE Transactions on Circuits and Systems I: Regular Papers
Volume64
Numéro de publication4
Les DOIs
étatPublié - 1 avr. 2017
Modification externeOui

Empreinte digitale

Examiner les sujets de recherche de « Robust Ultra-Low Power Non-Volatile Logic-in-Memory Circuits in FD-SOI Technology ». Ensemble, ils forment une empreinte digitale unique.

Contient cette citation