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Selective ablation of thin films with short and ultrashort laser pulses

  • J. Hermann
  • , M. Benfarah
  • , G. Coustillier
  • , S. Bruneau
  • , E. Axente
  • , J. F. Guillemoles
  • , M. Sentis
  • , P. Alloncle
  • , T. Itina
  • Laboratoire Lasers Plasmas et Procédés Photoniques
  • Lamsid/EDF/R and D
  • Plasma and Radiation Physics (INFLPR)

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

Micromachining of CuInSe 2 (CIS)-based photovoltaic devices with short and ultrashort laser pulses has been investigated. Therefore, ablation thresholds and ablation rates of ZnO, Mo and CuInSe 2 thin films have been measured for irradiation with nanosecond laser pulses of ultraviolet and visible light and subpicosecond laser pulses of a Ti:sapphire laser. The experimental results were compared to the theoretical evaluation of the samples heat regime. In addition, the cells photo-electrical properties were measured before and after laser machining. Scanning electron microscopy (SEM) and energy dispersive X-ray (EDX) analyses were employed to characterise the laser-induced ablation channels. Using nanosecond laser pulses, two phenomena were found to limit the laser-machining process. Residues of Mo that were projected onto the walls of the ablation channel and the metallization of the CuInSe 2 semiconductor close to the channel lead to a shunt. The latter causes the decrease of the photovoltaic efficiency. As a consequence of these limiting effects, only subpicosecond laser pulses allowed the selective or complete ablation of the thin layers without a relevant change of the photo-electrical properties.

langue originaleAnglais
Pages (de - à)4814-4818
Nombre de pages5
journalApplied Surface Science
Volume252
Numéro de publication13 SPEC. ISS.
Les DOIs
étatPublié - 30 avr. 2006
Modification externeOui

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