Résumé
The development of field-effect devices induced a demand for very fine, high-aspect-ratio tips, suitable for scanning tunneling and force microscopy and field-effect emitter arrays. Silicon pyramidal structures field emitter array (Si-FEA) was fabricated using pure thermal silicon dioxide as a mask for selective etch. Based on a new technology of carbon nanotubes selective growth on the tip of silicon pyramidal structures the emission efficiency of the processed silicon tips could be increased. The paper present first results of this technology.
| langue originale | Anglais |
|---|---|
| Pages | 97-100 |
| Nombre de pages | 4 |
| état | Publié - 1 janv. 2004 |
| Modification externe | Oui |
| Evénement | 27th International Semiconductor Conference, CAS 2004 - Sinaia, Roumanie Durée: 4 oct. 2004 → 6 oct. 2004 |
Une conférence
| Une conférence | 27th International Semiconductor Conference, CAS 2004 |
|---|---|
| Pays/Territoire | Roumanie |
| La ville | Sinaia |
| période | 4/10/04 → 6/10/04 |
Empreinte digitale
Examiner les sujets de recherche de « Single oriented carbon nanotubes growth on array of processed microelectrodes ». Ensemble, ils forment une empreinte digitale unique.Contient cette citation
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