Spatially and temporally resolved laser-induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma

J. P. Booth; G. Hancock; N. D. Perry; M. J. Toogood

doi:10.1063/1.343712

Spatially and temporally resolved laser-induced fluorescence measurements of CF₂ and CF radicals in a CF₄ rf plasma

J. P. Booth
, G. Hancock
, N. D. Perry
, M. J. Toogood

University of Oxford

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

155 Citations (Scopus)

Résumé

Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF₂ and CF radicals in a CF₄ plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate that for CF₂ and CF, wall removal processes are dominant at low pressures of the order of 50 mTorr, and that CF is not produced by electron impact dissociation of CF₂.

langue originale	Anglais
Pages (de - à)	5251-5257
Nombre de pages	7
journal	Journal of Applied Physics
Volume	66
Numéro de publication	11
Les DOIs	https://doi.org/10.1063/1.343712
état	Publié - 1 janv. 1989
Modification externe	Oui

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10.1063/1.343712

Contient cette citation

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title = "Spatially and temporally resolved laser-induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma",

abstract = "Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF2 and CF radicals in a CF4 plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate that for CF2 and CF, wall removal processes are dominant at low pressures of the order of 50 mTorr, and that CF is not produced by electron impact dissociation of CF2.",

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AU - Booth, J. P.

AU - Hancock, G.

AU - Perry, N. D.

AU - Toogood, M. J.

PY - 1989/1/1

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AB - Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF2 and CF radicals in a CF4 plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate that for CF2 and CF, wall removal processes are dominant at low pressures of the order of 50 mTorr, and that CF is not produced by electron impact dissociation of CF2.

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DO - 10.1063/1.343712

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JO - Journal of Applied Physics

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IS - 11

ER -

Spatially and temporally resolved laser-induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma

Résumé

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Contient cette citation

Spatially and temporally resolved laser-induced fluorescence measurements of CF₂ and CF radicals in a CF₄ rf plasma