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Study of 1/f and generation-recombination noise in four gate transistors

  • A. Luque Rodríguez
  • , J. A. Jiménez Tejada
  • , M. Marun González
  • , M. Reverto Planes
  • , P. López Varo
  • , A. Godoy
  • Departamento de Electrónica y Tecnología de Computadores
  • Universidad de Granada, Facultad de Ciencias

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1 Citation (Scopus)

Résumé

In this work, we study different noise sources that are present in four-gate field-effect-transistors (G4-FET). We present a model for the generation-recombination (g-r) noise due to traps located in the depletion regions and in the bulk, and for the 1/f noise due to traps in the top and bottom oxides. One of the main advantages of this structure is that the position and size of the conduction channel can be controlled by the application of adequate voltages to its gates (front and back MOS gates and two lateral JFET gates). However, the channel is also prone to be affected by the noise sources distributed throughout the device. Thus, the current noise power spectral density is a combination of all these noise sources. Experimental data showing such a combination are interpreted with our model.

langue originaleAnglais
titreProceedings of the IEEE 21st International Conference on Noise and Fluctuations, ICNF 2011
Pages283-286
Nombre de pages4
Les DOIs
étatPublié - 19 sept. 2011
Modification externeOui
Evénement21st International Conference on Noise and Fluctuations, ICNF 2011 - Toronto, ON, Canada
Durée: 12 juin 201116 juin 2011

Série de publications

NomProceedings of the IEEE 21st International Conference on Noise and Fluctuations, ICNF 2011

Une conférence

Une conférence21st International Conference on Noise and Fluctuations, ICNF 2011
Pays/TerritoireCanada
La villeToronto, ON
période12/06/1116/06/11

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