Résumé
This work describes a study performed on pm-Si:H PIN and NIP structures, deposited by PECVD. We show the effect of light-soaking (AM1.5) on pm-Si:H thin films structures optical properties. We propose a model for long range diffusion of hydrogen through the whole device. From the evolution of Raman spectra after annealing, we show that this long range motion of hydrogen causes a hydrogen rearrangement on the film along with a shift on the exodiffusion peaks explaining the degradation process in this type of devices. As a result we determined that for the PIN structure a hydrogen diffusion barrier is generated by defects, which causes a less degradation of its optoelectronic properties under illumination, and a more stable device during operation is expected.
| langue originale | Anglais |
|---|---|
| titre | 2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014 |
| Editeur | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 737-741 |
| Nombre de pages | 5 |
| ISBN (Electronique) | 9781479943982 |
| Les DOIs | |
| état | Publié - 15 oct. 2014 |
| Evénement | 40th IEEE Photovoltaic Specialist Conference, PVSC 2014 - Denver, États-Unis Durée: 8 juin 2014 → 13 juin 2014 |
Série de publications
| Nom | 2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014 |
|---|
Une conférence
| Une conférence | 40th IEEE Photovoltaic Specialist Conference, PVSC 2014 |
|---|---|
| Pays/Territoire | États-Unis |
| La ville | Denver |
| période | 8/06/14 → 13/06/14 |
SDG des Nations Unies
Ce résultat contribue à ou aux Objectifs de développement durable suivants
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SDG 7 Énergie abordable et propre
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