Surface chemistry and growth modes in the photochemical deposition of silica films

C. Licoppe; Y. I. Nissim; J. M. Moison

doi:10.1103/PhysRevB.45.6275

Surface chemistry and growth modes in the photochemical deposition of silica films

C. Licoppe
, Y. I. Nissim
, J. M. Moison

Orange Labs

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

Résumé

Local surface chemistry and nonlocal deposition modes in the photodeposition of silica films from silane and oxygen mixtures have been studied by surface-sensitive infrared vibrational spectroscopy. The two-step surface reaction leading to the photoinduced chemisorption of silane and oxygen is identified. Dynamic roughening of the growth front is shown to occur with a characteristic exponent of 0.340.05, fitting the Kardar-Parisi-Zhang model.

langue originale	Anglais
Pages (de - à)	6275-6278
Nombre de pages	4
journal	Physical Review B
Volume	45
Numéro de publication	11
Les DOIs	https://doi.org/10.1103/PhysRevB.45.6275
état	Publié - 1 janv. 1992
Modification externe	Oui

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10.1103/PhysRevB.45.6275

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title = "Surface chemistry and growth modes in the photochemical deposition of silica films",

abstract = "Local surface chemistry and nonlocal deposition modes in the photodeposition of silica films from silane and oxygen mixtures have been studied by surface-sensitive infrared vibrational spectroscopy. The two-step surface reaction leading to the photoinduced chemisorption of silane and oxygen is identified. Dynamic roughening of the growth front is shown to occur with a characteristic exponent of 0.340.05, fitting the Kardar-Parisi-Zhang model.",

author = "C. Licoppe and Nissim, \{Y. I.\} and Moison, \{J. M.\}",

year = "1992",

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doi = "10.1103/PhysRevB.45.6275",

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AU - Licoppe, C.

AU - Nissim, Y. I.

AU - Moison, J. M.

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N2 - Local surface chemistry and nonlocal deposition modes in the photodeposition of silica films from silane and oxygen mixtures have been studied by surface-sensitive infrared vibrational spectroscopy. The two-step surface reaction leading to the photoinduced chemisorption of silane and oxygen is identified. Dynamic roughening of the growth front is shown to occur with a characteristic exponent of 0.340.05, fitting the Kardar-Parisi-Zhang model.

AB - Local surface chemistry and nonlocal deposition modes in the photodeposition of silica films from silane and oxygen mixtures have been studied by surface-sensitive infrared vibrational spectroscopy. The two-step surface reaction leading to the photoinduced chemisorption of silane and oxygen is identified. Dynamic roughening of the growth front is shown to occur with a characteristic exponent of 0.340.05, fitting the Kardar-Parisi-Zhang model.

UR - https://www.scopus.com/pages/publications/0346493375

U2 - 10.1103/PhysRevB.45.6275

DO - 10.1103/PhysRevB.45.6275

M3 - Article

AN - SCOPUS:0346493375

SN - 0163-1829

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EP - 6278

JO - Physical Review B

JF - Physical Review B

IS - 11

ER -

Surface chemistry and growth modes in the photochemical deposition of silica films

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