Résumé
Carbon nitride films raise current interest for their potential applications as ultra-hard materials. We report on the formation of crystalline CN structures in films deposited at 248 nm on different substrates (sapphire, quartz, alumina) using the laser-induced CVD method and a gas mixture containing ethylene/nitrous oxide and ammonia as carbon and nitrogen source, respectively. The structural and morphological properties of the films were characterized by different analytical techniques (SEM, TEM, TED and XPS).
| langue originale | Anglais |
|---|---|
| Pages (de - à) | 413-418 |
| Nombre de pages | 6 |
| journal | Materials Research Society Symposium - Proceedings |
| Volume | 555 |
| état | Publié - 1 janv. 1999 |
| Modification externe | Oui |
| Evénement | Proceedings of the 1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998' - Boston, MA, USA Durée: 30 nov. 1998 → 3 déc. 1998 |
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