Résumé
We present the theory underlying the large numerical aperture objective micro-Raman backscattering experiment and apply it to the elaboration of a characterization methodology for the determination of the stress tensor in strained cubic semiconductor structures. The presented stress characterization technique consists in monitoring the variations of the stress-sensitive optical phonon peak position and linewidth while rotating stepwise the sample about its normal. The practical application of the technique is illustrated on a silicon-on-insulator (SOI) microelectronic structure demonstrating a plane stress-tensor determination.
| langue originale | Anglais |
|---|---|
| Pages (de - à) | 661-672 |
| Nombre de pages | 12 |
| journal | Journal of Raman Spectroscopy |
| Volume | 39 |
| Numéro de publication | 5 |
| Les DOIs | |
| état | Publié - 1 janv. 2008 |
Empreinte digitale
Examiner les sujets de recherche de « Theory and experiment of large numerical aperture objective Raman microscopy: Application to the stress-tensor determination in strained cubic materials ». Ensemble, ils forment une empreinte digitale unique.Contient cette citation
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver