Passer à la navigation principale Passer à la recherche Passer au contenu principal

Thermal decomposition of alkoxy monolayers grafted on silicon: A mechanistic model

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

A recent spectroscopic study showed that alkoxy monolayers grafted on a (111) silicon surface thermally decompose in the 200-400 C range by fragmentation of the alkyl chains [Surf. Sci. 601 (2007) 3961]. Here this behavior is reproduced by a numerical simulation, assuming that the elementary fragmentation steps have different probabilities, depending on the length of the fragments formed. The variation of the CH2/CH3 ratio, as determined experimentally by infrared spectroscopy, is reproduced with a set of fragmentation probabilities consistent with the enthalpy variation associated with each corresponding step.

langue originaleAnglais
Pages (de - à)230-235
Nombre de pages6
journalSurface Science
Volume609
Les DOIs
étatPublié - 1 mars 2013

Empreinte digitale

Examiner les sujets de recherche de « Thermal decomposition of alkoxy monolayers grafted on silicon: A mechanistic model ». Ensemble, ils forment une empreinte digitale unique.

Contient cette citation