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X-ray grating spectrometer for opacity measurements in the 50 eV to 250 eV spectral range at the LULI 2000 laser facility

  • Charles Reverdin
  • , Frédéric Thais
  • , Guillaume Loisel
  • , M. Busquet
  • , S. Bastiani-Ceccotti
  • , T. Blenski
  • , T. Caillaud
  • , J. E. Ducret
  • , W. Foelsner
  • , D. Gilles
  • , F. Gilleron
  • , J. C. Pain
  • , M. Poirier
  • , F. Serres
  • , V. Silvert
  • , G. Soullie
  • , S. Turck-Chieze
  • , B. Villette
  • CEA/UVSQ/CNRS
  • DSM/SPAM
  • Sandia National Laboratories, New Mexico
  • Artep Inc.
  • Univ. Bordeaux
  • Max-Planck Institut für Quantenoptik
  • Université Paris-Diderot

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

An x-ray grating spectrometer was built in order to measure opacities in the 50 eV to 250 eV spectral range with an average spectral resolution EδE ∼ 50. It has been used at the LULI-2000 laser facility at École Polytechnique (France) to measure the Δn=0, n=3 transitions of several elements with neighboring atomic number: Cr, Fe, Ni, and Cu in the same experimental conditions. Hence a spectrometer with a wide spectral range is required. This spectrometer features one line of sight looking through a heated sample at backlighter emission. It is outfitted with one toroidal condensing mirror and several flat mirrors cutting off higher energy photons. The spectral dispersion is obtained with a flatfield grating. Detection consists of a streak camera sensitive to soft x-ray radiation. Some experimental results showing the performance of this spectrometer are presented.

langue originaleAnglais
Numéro d'article10E134
journalReview of Scientific Instruments
Volume83
Numéro de publication10
Les DOIs
étatPublié - 1 oct. 2012

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