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XUV interferometry using high-order harmonics: Application to plasma diagnostics

  • J. F. Hergott
  • , P. Salières
  • , H. Merdji
  • , L. Le Déroff
  • , B. Carré
  • , T. Auguste
  • , P. Monot
  • , P. D'Oliveira
  • , D. Descamps
  • , J. Norin
  • , C. Lyng
  • , A. L'Huillier
  • , C. G. Wahlström
  • , M. Bellini
  • , S. Huller
  • DSM/SPAM
  • Lund Institute of Technology
  • LENS, University of Florence
  • CNRS

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

7 Citations (Scopus)

Résumé

In this paper, we present and compare the two different XUV interferometric techniques using high-order harmonics that have been developed so far. The first scheme is based on the interference between two spatially separated phase-locked harmonic sources while the second uses two temporally separated harmonic sources. These techniques have been applied to plasma diagnostics in feasibility experiments where electron densities up to a few 1020 e-/cm3 have be measured with a temporal resolution of 200 fs. We present the main characteristics of each technique and discuss their respective potentials and limitations.

langue originaleAnglais
Pages (de - à)35-40
Nombre de pages6
journalLaser and Particle Beams
Volume19
Numéro de publication1
Les DOIs
étatPublié - 12 sept. 2001
Modification externeOui

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